Log in
Sign up
Golden has been acquired by ComplyAdvantage.Read about it here ⟶
‌

Amanda C. Walke

OverviewStructured DataIssuesContributorsActivity

All edits

Edits on 14 Dec, 2021
"Remove inverse infobox"
Golden AI profile picture
Golden AI
edited on 14 Dec, 2021
Edits made to:
Infobox (-369 properties)
Infobox
Patent primary examiner of
‌
US Patent 11167631 Assembly of electric accumulators
‌
US Patent 11177488 System comprising a fuel-cell stack, and associated control method
‌
US Patent 7175966 Water and aqueous base soluble antireflective coating/hardmask materials
‌
US Patent 7285371 Photosensitive composition and color paste
‌
US Patent 7294449 Radiation patternable functional materials, methods of their use, and structures formed therefrom
‌
US Patent 7303852 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method
‌
US Patent 7314699 Radiation-sensitive mixture and recording material produced therewith
‌
US Patent 7316874 Process and donor elements for transferring thermally sensitive materials to substrates by thermal imaging
‌
US Patent 7316891 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
‌
US Patent 7320854 Radiation sensitive refractive index changing composition, pattern forming method and optical material
‌
US Patent 7326511 Sulfonate derivatives and the use thereof as latent acids
‌
US Patent 7326516 Resist composition for immersion exposure and pattern formation method using the same
‌
US Patent 7326517 Planographic printing plate material and preparing process of planographic printing plate
‌
US Patent 7332257 Composition for optical film, and optical film
‌
US Patent 7332259 Aluminum support for planographic printing plate, its manufacturing process, and planographic printing plate material
‌
US Patent 7332262 Photolithography scheme using a silicon containing resist
‌
US Patent 7335454 Positive resist composition
‌
US Patent 7335456 Top coat material and use thereof in lithography processes
‌
US Patent 7335462 Method of depositing an amorphous carbon layer
‌
US Patent 7338740 Positive resist composition
‌
US Patent 7338756 Method of preparation of direct dispersions of photographically useful chemicals
‌
US Patent 7344822 Resist material and nanofabrication method
‌
US Patent 7358027 Copolymer for use in chemical amplification resists
‌
US Patent 11180469 Method for preparing sultone derivatives
‌
US Patent 11180620 Proton-conducting inorganic particles, method for the preparation thereof, and use thereof to form a fuel cell membrane
‌
US Patent 11180828 Aluminum porous body and method for producing aluminum porous body
‌
US Patent 11181868 Method for manufacturing a timepiece component and component obtained by this method
‌
US Patent 11183693 Resin composition for power storage device electrode
‌
US Patent 11183698 Fuel cell device and method for operating a fuel cell device
‌
US Patent 11183707 Anode material, method for making the same, and lithium-ion battery
‌
US Patent 7364835 Developer-soluble materials and methods of using the same in via-first dual damascene applications
‌
US Patent 7371512 Silver halide photographic emulsion and silver halide photographic lightsensitive material using the same
‌
US Patent 7381516 Multiphoton photosensitization system
‌
US Patent 7393624 Negative resists based on acid-catalyzed elimination of polar molecules
‌
US Patent 7396634 Photosensitive composition
‌
US Patent 7402374 Method for colored image formation
‌
US Patent 7402376 Photosensitive resin composition and photosensitive dry film containing the same
‌
US Patent 7402379 Resist exposure system and method of forming a pattern on a resist
‌
US Patent 7405034 Polymeric structures, particularly microstructures, and methods for making same
‌
US Patent 7407734 Resist composition for electron beam or EUV
‌
US Patent 7407737 Method for the production of photoresist structures
‌
US Patent 7413844 Lithographic printing plate support and method of manufacturing the same
‌
US Patent 7413848 Method of removing photoresist and photoresist rework method
‌
US Patent 7416833 Photoresist undercoat-forming material and patterning process
‌
US Patent 7419758 Lithographic printing plate precursor and lithographic printing method
‌
US Patent 7419766 Flexographic printing plate precursor and imaging method
‌
US Patent 7419768 Methods of fabricating integrated circuitry
‌
US Patent 7422836 Dissolution rate modifiers for photoresist compositions
‌
US Patent 7422837 Photosensitive composition
‌
US Patent 7425400 Planographic printing plate precursor
‌
US Patent 7425405 Method for making a lithographic printing plate
‌
US Patent 7425406 Lithographic printing plate precursor and lithographic printing method
‌
US Patent 7427463 Photoresists with reduced outgassing for extreme ultraviolet lithography
‌
US Patent 7427465 On-press development of high speed laser sensitive lithographic printing plates
‌
US Patent 7432027 Dual-layer protected transient document
‌
US Patent 7432035 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
‌
US Patent 7435516 Photosensitive material for non-substrate liquid crystal display
‌
US Patent 7435524 Permanent, removable tissue markings
‌
US Patent 7435527 Positive resist composition
‌
US Patent 7435529 Photosensitive composition and image recording method using the same
‌
US Patent 7435531 Image forming material
‌
US Patent 7442487 Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
‌
US Patent 7442488 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
‌
US Patent 7442489 Photoresist composition and method of forming a photoresist pattern using the same
‌
US Patent 7442492 Planographic printing plate precursor
‌
US Patent 7442493 Lithographic printing method
‌
US Patent 7445880 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof
‌
US Patent 7449282 Lithographic printing plate precursor
‌
US Patent 7452655 Acrylic copolymer and radiation-sensitive resin composition
‌
US Patent 7452656 Electrically conductive patterns, antennas and methods of manufacture
‌
US Patent 7455950 Resist material and pattern formation method using the same
‌
US Patent 7455952 Patterning process and resist overcoat material
‌
US Patent 7455953 Positive working heat-sensitive lithographic printing plate precursor
‌
US Patent 7455954 Lithographic printing plate precursor and polymerizable composition
‌
US Patent 7462437 Presensitized lithographic plate comprising support and hydrophilic image-recording layer
‌
US Patent 7462438 Resist material and pattern formation method using the same
‌
US Patent 7462440 Lithographic printing plate precursor and lithographic printing method using the same
‌
US Patent 7462441 Planographic printing plate material and printing method
‌
US Patent 7462443 Leuco dye-containing coating compositions
‌
US Patent 7465527 Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same
‌
US Patent 7465530 Inorganic resist material and nano-fabrication method by utilizing the same
‌
US Patent 7470500 Organic bottom antireflective polymer compositions
‌
US Patent 7473512 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
‌
US Patent 7473516 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
‌
US Patent 7476484 Photocrosslinkable polyurethanes
‌
US Patent 7476485 Resist lower layer film material and method for forming a pattern
‌
US Patent 7479362 UV decomposable molecules and a photopatternable monomolecular film formed therefrom
‌
US Patent 7479364 Copolymer for use in chemical amplification resists
‌
US Patent 7482108 Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
‌
US Patent 7485397 Reusable printing plate, printing press and printing unit having the printing plate, process for imaging the printing plate and process for preparation of a fluorinated organic phosphonic acid
‌
US Patent 7485404 Nonsolvate-form crystal of polymethine compound and process for producing the same
‌
US Patent 7485405 Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film
‌
US Patent 7485406 Photostorage solid drawing medium
‌
US Patent 7488566 Positive type radiation-sensitive resin composition
‌
US Patent 7494759 Positive resist compositions and process for the formation of resist patterns with the same
‌
US Patent 7498117 System and method for radiation imaging by in-situ particle formation
‌
US Patent 7498122 Solvent-less process for producing transient documents
‌
US Patent 7498125 Non-transparent microvoided biaxially stretched film, production process therefor and process for obtaining a transparent pattern therewith
‌
US Patent 7501220 Resist composition
‌
US Patent 7501230 Photoactive adhesion promoter
‌
US Patent 7504191 Photosensitive resin composition and method for the formation of a resin pattern using the composition
‌
US Patent 7504192 Soft pellicle for 157 and 193 nm and method of making same
‌
US Patent 7504194 Positive resist composition and pattern making method using the same
‌
US Patent 7504198 Methods for enhancing resolution of a chemically amplified photoresist
‌
US Patent 7507512 Particle-in-binder X-ray sensitive coating using polyimide binder
‌
US Patent 7507520 Composition for forming a conjugated polymer pattern and process of forming a conjugated polymer pattern using the same
‌
US Patent 7507521 Silicon based optically degraded arc for lithographic patterning
‌
US Patent 7510817 Photoresist polymer compositions
‌
US Patent 7514188 Process for providing marking on security papers
‌
US Patent 7514198 Color forming composition containing a plurality of antenna dyes
‌
US Patent 11189828 Lithium metal pouch cells and methods of making the same
‌
US Patent 7517634 Photoresist polymers
‌
US Patent 7517637 Method of producing self-aligned mask in conjunction with blocking mask, articles produced by same and composition for same
‌
US Patent 7521169 Radiation-sensitive resin composition
‌
US Patent 7521170 Photoactive compounds
‌
US Patent 7521173 Extrudable antistatic tielayers
‌
US Patent 7524605 Lithographic printing plate precursor and lithographic printing method
‌
US Patent 7524606 Nanocomposite photoresist composition for imaging thick films
‌
US Patent 7527909 Resist composition
‌
US Patent 7527915 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
‌
US Patent 7531287 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
‌
US Patent 7531288 Photosensitive lithographic printing plate
‌
US Patent 7531291 Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same
‌
US Patent 7534547 Optically active compound and photosensitive resin composition
‌
US Patent 7534550 Positive resist composition and process for formation of resist patterns
‌
US Patent 7537878 Method of fabricating organic light emitting display
‌
US Patent 7541119 Inkless reimageable printing paper and method
‌
US Patent 7544448 Tetrabenzodiazadiketoperylene pigments for laser marking
‌
US Patent 7544461 Near infrared ray activation type positive resin composition
‌
US Patent 7550246 Photoacid generator
‌
US Patent 7550248 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
‌
US Patent 7550250 Positive resist composition and pattern forming method using the same
‌
US Patent 7553602 Transfer substrate, transfer method, and organic electroluminescent device manufacturing method
‌
US Patent 7553603 Inkless printing paper and method
‌
US Patent 7553605 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate
‌
US Patent 7556909 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
‌
US Patent 7556910 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
‌
US Patent 7556911 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method
‌
US Patent 7560220 Resist material and nanofabrication method
‌
US Patent 7563556 Multilayer element with low pH developer solubility
‌
US Patent 7563558 Negative resists based on acid-catalyzed elimination of polar molecules
‌
US Patent 7569316 Inkless reimageable printing paper and method
‌
US Patent 7569324 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
‌
US Patent 7569336 Composition for removing photoresist and method of forming a pattern using the same
‌
US Patent 7572560 Inkless reimageable printing paper and method
‌
US Patent 7572568 Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate
‌
US Patent 7572569 Inkless printing paper and method
‌
US Patent 7575844 Color forming composites capable of multi-colored imaging and associated systems and methods
‌
US Patent 7575847 Low refractive index composition comprising fluoropolyether urethane compound
‌
US Patent 7575848 Image recording media and image layers
‌
US Patent 7575849 Imaging layers and structures including imaging layers
‌
US Patent 7579138 Method for forming micropattern
‌
US Patent 7582398 Inkless reimageable printing paper and method
‌
US Patent 7582407 Imageable elements with low pH developer solubility
‌
US Patent 7582408 Color forming compositions with a fluoran leuco dye having a latent developer
‌
US Patent 7582412 Multilayer photoresist systems
‌
US Patent 7585610 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
‌
US Patent 7585611 Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof
‌
US Patent 7585615 Composite photoresist for modifying die-side bumps
‌
US Patent 7588877 Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
‌
US Patent 7588878 Inkless printing paper and method
‌
US Patent 7592121 Antireflection film, polarizing plate and display device
‌
US Patent 7592127 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
‌
US Patent 7592132 Method for fine pattern formation
‌
US Patent 7595141 Composition for coating over a photoresist pattern
‌
US Patent 7595143 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
‌
US Patent 7598014 Thick film photoresist composition and method of forming resist pattern
‌
US Patent 7598019 Method for cleavage of labile functional groups from chemical compounds
‌
US Patent 7604916 Donor films with pattern-directing layers
‌
US Patent 7608383 UV radiation blocking protective layers compatible with thick film pastes
‌
US Patent 7608386 Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
‌
US Patent 7611817 Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
‌
US Patent 7611818 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
‌
US Patent 7611819 Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
‌
US Patent 7611820 Positive resist composition and pattern-forming method using the same
‌
US Patent 7611821 Positive resist compositions and patterning process
‌
US Patent 7611826 Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
‌
US Patent 7611828 Photoactive adhesion promoter
‌
US Patent RE40964 Negative type resist composition
‌
US Patent 7622241 Initiator compositions, negative-working imageable elements, and methods of use
‌
US Patent 7622243 Photosensitive element, resist pattern formation method and printed wiring board production method
‌
US Patent 7625688 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
‌
US Patent 7629108 Nitrogen-containing organic compound, resist composition and patterning process
‌
US Patent 7632621 Mask
‌
US Patent 7635552 Photoresist composition with antibacterial agent
‌
US Patent 7635553 Pattern forming method and resist composition used therefor
‌
US Patent 7638255 Method for forming image through reaction development
‌
US Patent 7638261 Radiation-sensitive resin composition
‌
US Patent 7638268 Rework process for photoresist film
‌
US Patent 7642043 Rework process for photoresist film
‌
US Patent 7645556 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
‌
US Patent 7645557 Positive resist composition for immersion exposure and pattern forming method using the same
‌
US Patent 7645558 Inkless reimageable printing paper and method
‌
US Patent 7645560 Inkless reimageable printing paper and method
‌
US Patent 7645561 Photosensitive film
‌
US Patent 7645562 Photosensitive film
‌
US Patent 7648815 Negative photosensitive polyimide composition and method for forming image the same
‌
US Patent 7651833 Method for preparing photochromic film or plate
‌
US Patent 7655366 Inkless reimageable printing paper and method
‌
US Patent 7655380 Polymeric material, containing a latent acid
‌
US Patent 7662539 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
‌
US Patent 7662540 Pattern forming material, pattern forming apparatus and pattern forming process
‌
US Patent 7666558 Inkless reimageable printing paper and method
‌
US Patent 7666567 Negative imaging method for providing a patterned metal layer having high conductivity
‌
US Patent 7666568 Composition and method for providing a patterned metal layer having high conductivity
‌
US Patent 7666570 Laser induced thermal imaging method and fabricating method of organic light-emitting diode using the same
‌
US Patent 7670747 Pattern transfer method
‌
US Patent 7670748 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
‌
US Patent 7670750 Polymer, resist protective coating material, and patterning process
‌
US Patent 7670751 Photoacid generator, resist composition, and patterning process
‌
US Patent 7678515 Thermally gated photochromic medium
‌
US Patent 7678527 Methods and compositions for providing photoresist with improved properties for contacting liquids
‌
US Patent 7678532 Method of processing a substrate
‌
US Patent 7679714 Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method
‌
US Patent 7681519 Apparatus for coating a photoresist layer
‌
US Patent 7687224 Photosensitive film
‌
US Patent 7691554 Image forming method and image display body
‌
US Patent 7691556 Antireflective compositions for photoresists
‌
US Patent 7691558 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
‌
US Patent 7691559 Immersion lithography edge bead removal
‌
US Patent 7695889 Copolymer for semiconductor lithography and process for production thereof
‌
US Patent 7695890 Negative photoresist for silicon KOH etch without silicon nitride
‌
US Patent 7695894 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
‌
US Patent 7700260 Pattern forming method
‌
US Patent 7700262 Top coat material and use thereof in lithography processes
‌
US Patent 7700269 Method of forming stack layer and method of manufacturing electronic device having the same
‌
US Patent 7704651 Radiographic image conversion panel and production method thereof
‌
US Patent 7704667 Dyes and use thereof in imaging members and methods
‌
US Patent 7704668 Photoresist compositions and methods and articles of manufacture comprising same
‌
US Patent 7704670 High silicon-content thin film thermosets
‌
US Patent 7704672 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device
‌
US Patent 7704674 Method for patterning a photo-resist in an immersion lithography process
‌
US Patent 7709164 Solvent-less process for producing transient documents
‌
US Patent 7709178 Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride
‌
US Patent 7709180 Soft pellicle and method of making same
‌
US Patent 7713677 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
‌
US Patent 7718325 Photochromic material, inkless reimageable printing paper, and methods
‌
US Patent 7718341 Laser induced thermal imaging apparatus and manufacturing method of organic light emitting diode using the same
‌
US Patent 7718345 Composite photoresist structure
‌
US Patent 7723009 Topography based patterning
‌
US Patent 7723011 Image recording material and novel compound
‌
US Patent 7723016 Method for forming resist pattern and method for manufacturing a semiconductor device
‌
US Patent 7727702 Method of coloring a coating composition
‌
US Patent 7727703 Methods of fabricating an electronic device and an sililation polyvinyl phenol for a dielectric layer of an electronic device
‌
US Patent 7732117 Photocatalyst composition and photocatalyst containing layer
‌
US Patent 7732119 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
‌
US Patent 7732120 Method for making soft pellicles
‌
US Patent 7736822 Resist underlayer coating forming composition for mask blank, mask blank and mask
‌
US Patent 7736825 Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system
‌
US Patent 7736834 Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product
‌
US Patent 7736843 Method for manufacturing a semiconductor device
‌
US Patent 7741004 Method of forming pattern by utilizing coatable inorganic material
‌
US Patent 7741006 Laser patterning method for fabricating disc stamper
‌
US Patent 7741429 Process for preparing stable photoresist compositions
‌
US Patent 7745091 Miniaturized microparticles
‌
US Patent 7745092 Multiple step printing methods for microbarcodes
‌
US Patent 7745094 Resist composition and patterning process using the same
‌
US Patent 7745095 Lithographic method and device manufactured thereby
‌
US Patent 7749678 Photosensitive composition and pattern forming method using the same
‌
US Patent 7749681 Composition for forming lower layer film and pattern forming method
‌
US Patent 7749682 Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall
‌
US Patent 7754412 Process for preparing a flexographic printing plate from a photopolymerizable element
‌
US Patent 7754413 Color forming composition with enhanced image stability
‌
US Patent 7754416 Process for producing resist pattern and conductor pattern
‌
US Patent 7754417 Printed circuits and method for making same
‌
US Patent 7759042 Donor films with pattern-directing layers
‌
US Patent 7759053 Methods of fabricating integrated circuitry
‌
US Patent 7776507 Photosensitive paste and manufacturing method of member for display panel
‌
US Patent RE41579 Positive type photosensitive image-forming material for use with an infrared laser
‌
US Patent 7781141 Compositions and processes for immersion lithography
‌
US Patent 7785765 Photosensitive resin composition
‌
US Patent 7785767 Positive resist composition and pattern forming method using the same
‌
US Patent 7790349 Blanket for a printing roll, method of manufacturing the same, patterning method using the same, and method of manufacturing liquid crystal display device
‌
US Patent 7790350 Method and materials for patterning a neutral surface
‌
US Patent 7790351 Positive resist composition and pattern making method using the same
‌
US Patent 7790354 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
‌
US Patent 7799503 Composite structures to prevent pattern collapse
‌
US Patent 7799508 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
‌
US Patent 7807328 Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
‌
US Patent 7807330 Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
‌
US Patent 7807333 Method and apparatus for development of lithographic printing plate precursor
‌
US Patent 7811741 Reverse write erasable paper
‌
US Patent 7811744 Material for infrared laser ablated engraved flexographic printing plates
‌
US Patent 7813674 Developing toner for electrophotography and electro-photographic device
‌
US Patent 7816064 Image-forming method using heat-sensitive transfer system
‌
US Patent 7816068 Underlayer compositions containing heterocyclic aromatic structures
‌
US Patent 7816072 Positive resist composition and method for forming resist pattern
‌
US Patent 7816276 Substrate treatment system, substrate treatment method, and computer readable storage medium
‌
US Patent 7820356 Optical waveguides and methods thereof
‌
US Patent 7820358 Photo-resist material structure and method of producing the same
‌
US Patent 7820359 Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
‌
US Patent 7820360 Polymer compound, negative resist composition, and method of forming resist pattern
‌
US Patent 7824838 Method of manufacturing printed circuit board
‌
US Patent 7824839 Photoacid generator compounds and compositions
‌
US Patent 7828487 Post-exposure baking apparatus and related method
‌
US Patent 7829258 Laser coloration of coated substrates
‌
US Patent 7829265 Printed wiring board, method for forming the printed wiring board, and board interconnection structure
‌
US Patent 7829268 Method for air gap formation using UV-decomposable materials
‌
US Patent 7829270 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel
‌
US Patent 7833692 Amine-arresting additives for materials used in photolithographic processes
‌
US Patent 7833693 Photoactive compounds
‌
US Patent 7838195 Planar test substrate for non-contact printing
‌
US Patent 7838196 Resist for soft mold and method for fabricating liquid crystal display using the same
‌
US Patent 7838198 Photoresist compositions and method for multiple exposures with multiple layer resist systems
‌
US Patent 7838200 Photoresist compositions and method for multiple exposures with multiple layer resist systems
‌
US Patent 7842451 Method of forming pattern
‌
US Patent 7851127 Polymer compound, positive resist composition and resist pattern forming method
‌
US Patent 7851129 Resist composition, resist pattern forming method and compound
‌
US Patent 7851131 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
‌
US Patent 7851138 Patterning a surface comprising silicon and carbon
‌
US Patent 7851551 Polymer processes
‌
US Patent 7858289 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
‌
US Patent 7862982 Chemical trim of photoresist lines by means of a tuned overcoat material
‌
US Patent 7862983 Process for preparing stable photoresist compositions
‌
US Patent 7867686 Metal deposition
‌
US Patent 7867688 Laser ablation resist
‌
US Patent 7875408 Bleachable materials for lithography
‌
US Patent 7875420 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
‌
US Patent 7879524 Image-forming method using heat-sensitive transfer system
‌
US Patent 7879525 Chemically amplified photoresist composition, laminated product, and connection element
‌
US Patent 7879528 Resist composition for electron beam or EUV
‌
US Patent RE42128 Compositions for removing residue from a substrate and use thereof
‌
US Patent 7883829 Lithography for pitch reduction
‌
US Patent 7887989 Compositions and processes for preparing color filter elements
‌
US Patent 7887992 Photosensitive paste and process for production of pattern using the same
‌
US Patent 7887996 Method of pattern transfer
‌
US Patent 7888528 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
‌
US Patent 7897320 Thermoplastic material comprising polychromic substances
‌
US Patent 7901866 Pattern forming method
‌
US Patent 7906267 Heat-sensitive transfer image-receiving sheet
‌
US Patent 7906274 Method of creating a template employing a lift-off process
‌
US Patent 7914967 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
‌
US Patent 7919224 Coating materials consisting of low- or medium-molecular organic compounds
‌
US Patent 7923194 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
‌
US Patent 7923196 Positive resist composition and pattern forming method using the same
‌
US Patent 7924300 Processor for imaging media
‌
US Patent 7935463 Reusable paper media with compatibility markings and printer with incompatible media sensor
‌
US Patent 7935471 NIR/IR curable coatings for light directed imaging
‌
US Patent 7939242 Barrier film material and pattern formation method using the same
‌
US Patent 7939244 Photosensitive hardmask for microlithography
‌
US Patent 7947424 Composition for forming anti-reflective coat
‌
US Patent 7951521 Transfer substrate, transfer method, and method of manufacturing display device
‌
US Patent 7951525 Low outgassing photoresist compositions
‌
US Patent 7955777 Compound, acid generator, resist composition and method of forming resist pattern
‌
US Patent 7955780 Positive resist composition and pattern forming method using the same
‌
US Patent 7955783 Lamination for printed photomask
‌
US Patent 7960090 Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method
‌
US Patent 7960091 Resist composition and method of forming resist pattern
‌
US Patent 7964332 Methods of forming a pattern of a semiconductor device
‌
US Patent 7964335 Ink receptive photosensitive laminate
‌
US Patent 7977038 Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon
‌
US Patent 7985527 Conductive film and method of producing thereof
‌
US Patent 7989138 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
‌
US Patent 7993806 Transfer substrate, and fabrication process of organic electroluminescent devices
‌
US Patent 7993807 Compositions, systems, and methods for imaging
‌
US Patent 7993808 TARC material for immersion watermark reduction
‌
US Patent 7993809 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
‌
US Patent 7998653 Coating compositions comprising a latent activator for marking substrates
‌
US Patent 7998655 Method of forming patterns
‌
US Patent 7998664 Processing liquid for resist substrate and method of processing resist substrate using the same
‌
US Patent 8003292 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
‌
US Patent 8003293 Pixelated photoresists
‌
US Patent 8003295 Patterning process and resist composition used therein
‌
US Patent 8003297 Polymeric material, containing a latent acid
‌
US Patent 8007980 Resist for printing and patterning method using the same
‌
US Patent 8007981 Resist composition and method of forming resist pattern
‌
US Patent 8012667 Soft mold and method of fabricating the same
‌
US Patent 8012669 Resist composition and method of forming resist pattern
‌
US Patent 8012676 Process for preparing conductive material
Edits on 13 Dec, 2021
Golden AI profile picture
Golden AI
edited on 13 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8012676 Process for preparing conductive material
Golden AI profile picture
Golden AI
edited on 13 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8012669 Resist composition and method of forming resist pattern
Golden AI profile picture
Golden AI
edited on 13 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8012667 Soft mold and method of fabricating the same
Edits on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8007981 Resist composition and method of forming resist pattern
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8007980 Resist for printing and patterning method using the same
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8003293 Pixelated photoresists
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8003297 Polymeric material, containing a latent acid
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8003295 Patterning process and resist composition used therein
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7998653 Coating compositions comprising a latent activator for marking substrates
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7998655 Method of forming patterns
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7993806 Transfer substrate, and fabrication process of organic electroluminescent devices
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7993807 Compositions, systems, and methods for imaging
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7993808 TARC material for immersion watermark reduction
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7985527 Conductive film and method of producing thereof
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021

Find more people like Amanda C. Walke

Use the Golden Query Tool to discover related individuals, professionals, or experts with similar interests, expertise, or connections in the Knowledge Graph.
Open Query Tool
Access by API
Golden Query Tool
Golden logo
By using this site, you agree to our Terms of Service.