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US Patent 7824839 Photoacid generator compounds and compositions

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Ramakrishnan Ayothi0

Christopher K. Ober0

Yi Yi0

Date of Patent

November 2, 2010

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Patent Application Number

122552660

Date Filed

October 21, 2008

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Patent Citations Received

US Patent 11685117 Three-dimensional printing methods for reducing bubbles by de-gassing through build plate

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US Patent 12010287 System and method for a three-dimensional optical switch display device

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US Patent 11787878 Photocurable compositions for stereolithography, method of forming the compositions, stereolithography methods using the compositions, polymer components formed by the stereolithography methods, and a device including the polymer components

Patent Primary Examiner

Amanda C. Walke

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Patent abstract

The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

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