Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takeo Watanabe0
Hideo Hada0
Hiroo Kinoshita0
Date of Patent
August 5, 2008
0Patent Application Number
105740730
Date Filed
October 20, 2004
0Patent Primary Examiner
Patent abstract
A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.
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