US Patent 7833692 Amine-arresting additives for materials used in photolithographic processes

Novel, poison-blocking compositions and methods of using those compositions to form poison-blocking layers are provided. The compositions comprise a typical composition used in microlithographic processes, but with a poison-blocking additive included in that composition. The preferred additive is a compound comprising one or more blocked isocyanates. Upon heating to certain temperatures, the blocking group is released from the isocyanate, leaving behind a moiety that is highly reactive with the poisonous amines generated by typical dielectric layers.