Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dana A. Gronbeck0
George G. Barclay0
James F. Cameron0
Date of Patent
September 1, 2009
0Patent Application Number
107179750
Date Filed
November 20, 2003
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.
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