Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ching-Yu Chang0
Date of Patent
August 9, 2011
0Patent Application Number
113245880
Date Filed
January 3, 2006
0Patent Primary Examiner
Patent abstract
A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer.
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