Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 8, 2009
Patent Application Number
11976426
Date Filed
October 24, 2007
Patent Primary Examiner
Patent abstract
A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
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