Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 14, 2008
Patent Application Number
10867634
Date Filed
June 16, 2004
Patent Primary Examiner
Patent abstract
A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that is insoluble or hardly soluble in an alkali developing solution but becomes soluble in the alkali developing solution by the action of an acid, and (C) a compound having at least one group that is decomposed with an acid to generate a carboxylic acid and at least three groups selected from hydroxy group and substituted hydroxy group.
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