US Patent 7435527 Positive resist composition
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Patent abstract
A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that is insoluble or hardly soluble in an alkali developing solution but becomes soluble in the alkali developing solution by the action of an acid, and (C) a compound having at least one group that is decomposed with an acid to generate a carboxylic acid and at least three groups selected from hydroxy group and substituted hydroxy group.
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US Patent 07435527 Positive resist composition US Patent 7435527 Positive resist composition
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Patent Number
0743552700
Patent Number
743552700
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Patent Jurisdiction
Patent Number
074355270
Date of Patent
October 14, 2008
0Patent Application Number
108676340
Date Filed
June 16, 2004
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
074355270
Date of Patent
October 14, 2008
0Patent Application Number
108676340
Date Filed
June 16, 2004
0Official Website
Patent Primary Examiner
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US Patent 07435527 Positive resist composition
Infobox
Is a
Patent jurisdiction
Patent number
07435527
Date of patent
October 14, 2008
Patent application number
10867634
Date Filed
June 16, 2004
Patent primary examiner
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