Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jui-Tsen Huang0
Date of Patent
May 18, 2010
0Patent Application Number
121020290
Date Filed
April 14, 2008
0Patent Primary Examiner
Patent abstract
A composite photoresist structure includes a first organic layer disposed over a substrate to be etched, a sacrificial layer disposed on the first organic layer, and a second organic layer disposed on the sacrificial layer. The thickness of the first organic layer and the thickness of the second organic layer are both larger than the thickness of the sacrificial layer.
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