Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 29, 2009
0Patent Application Number
115949370
Date Filed
November 9, 2006
0Patent Primary Examiner
Patent abstract
There is disclosed a rework process for a photoresist film over a substrate having at least a first antireflection silicone resin film and the photoresist film over the first silicone resin film comprising: at leastremoving the photoresist film with a solvent while leaving the first silicone resin film unremoved;forming a second antireflection silicone resin film over the first silicone resin film; andforming a photoresist film again over the second silicone resin film. There can be provided a rework process for a photoresist film that can be conducted more easily at lower cost and provide more certainly an excellent resist pattern.
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