Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 25, 2008
Patent Application Number
11105510
Date Filed
April 14, 2005
Patent Primary Examiner
Patent abstract
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.
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