Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ernisse Putna0
Sergei V. Koveshnikov0
Kyle Y. Flanigan0
Juan E. Dominguez0
Date of Patent
March 24, 2009
0Patent Application Number
109146050
Date Filed
August 9, 2004
0Patent Primary Examiner
Patent abstract
An optically tuned SLAM (Sacrificial Light-Absorbing Material) may be used in a via-first dual damascene patterning process to facilitate removal of the SLAM. The monomers used to produce the optically tuned SLAM may be modified to place an optically sensitive structure in the backbone of the SLAM polymer. The wafer may be exposed to a wavelength to which the SLAM is tuned prior to etching and/or ashing steps to degrade the optically tuned SLAM and facilitate removal.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
