US Patent 7517634 Photoresist polymers

Patent 7517634 was granted and assigned to JSR Corporation on April, 2009 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Current Assignee

JSR Corporation

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

75176340

Patent Inventor Names

Isao Nishimura0

Kenji Okamoto0

Yong Wang0

Adam Safir0

Didier Benoit0

Dominique Charmot0

Han-Ting Chang0

Date of Patent

April 14, 2009

Patent Application Number

113006580

Date Filed

December 12, 2005

Patent Primary Examiner

‌

Amanda C. Walke

Patent abstract

The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.