US Patent 7517634 Photoresist polymers
Patent 7517634 was granted and assigned to JSR Corporation on April, 2009 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
December 12, 2005
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Date of Patent
April 14, 2009
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Patent Application Number
11300658
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Patent Inventor Names
Isao Nishimura
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Kenji Okamoto
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Yong Wang
0
Adam Safir
0
Didier Benoit
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Dominique Charmot
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Han-Ting Chang
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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