Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shinichi Kanna0
Tomoya Sasaki0
Kazuyoshi Mizutani0
Kunihiko Kodama0
Date of Patent
February 26, 2008
0Patent Application Number
103171100
Date Filed
December 12, 2002
0Patent Primary Examiner
Patent abstract
A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.
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