Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 3, 2009
0Patent Application Number
117743000
Date Filed
July 6, 2007
0Patent Primary Examiner
Patent abstract
A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of β-elimination, and (B) a photoacid generator. The resist composition exhibits a high resolution when processed by ArF lithography.
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