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US Patent 7611821 Positive resist compositions and patterning process

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Edits on 16 Sep, 2023
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edited on 16 Sep, 2023
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Patent abstract

A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of β-elimination, and (B) a photoacid generator. The resist composition exhibits a high resolution when processed by ArF lithography.

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edited on 7 Aug, 2023
Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
76118210
Date of Patent
November 3, 2009
0
Patent Application Number
117743000
Date Filed
July 6, 2007
0
Patent Primary Examiner
‌
Amanda C. Walke
0
Edits on 25 May, 2023
"Remove website redirecting to Patent Public Search front page"
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Golden AI
edited on 25 May, 2023
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Infobox (-1 properties)
Infobox
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=0761182100
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edited on 22 May, 2023
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US Patent 07611821 Positive resist compositions and patterning process US Patent 7611821 Positive resist compositions and patterning process

Infobox
Patent Number
0761182100
Patent Number
761182100
Edits on 31 Mar, 2023
"Entity importer update"
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Golden AI
edited on 31 Mar, 2023
Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
076118210
Date of Patent
November 3, 2009
0
Patent Application Number
117743000
Date Filed
July 6, 2007
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=076118210
Patent Primary Examiner
‌
Amanda C. Walke
0
Edits on 22 Sep, 2022
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 22 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
076118210
Date of Patent
November 3, 2009
0
Patent Application Number
117743000
Date Filed
July 6, 2007
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=076118210
Patent Primary Examiner
‌
Amanda C. Walke
0
Edits on 18 Jun, 2022
"Entity importer update"
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Golden AI
edited on 18 Jun, 2022
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Infobox (+1 properties)
Infobox
Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07611821
Edits on 3 Dec, 2021
"Created via: Entity Importer"
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created this topic on 3 Dec, 2021
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Infobox (+7 properties)
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 US Patent 07611821 Positive resist compositions and patterning process

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07611821
Date of patent
November 3, 2009
Patent application number
11774300
Date Filed
July 6, 2007
Patent primary examiner
‌
Amanda C. Walke

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