US Patent 7462438 Resist material and pattern formation method using the same

Patent 7462438 was granted and assigned to Panasonic on December, 2008 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Panasonic

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

74624380

Patent Inventor Names

Masayuki Endo0

Masaru Sasago0

Date of Patent

December 9, 2008

Patent Application Number

114151580

Date Filed

May 2, 2006

Patent Primary Examiner

‌

Amanda C. Walke

Patent abstract

A resist film made of a resist material including 4-pentanelactam, that is, hetero cyclic ketone, is formed on a substrate, and subsequently, pattern exposure is performed by irradiating the resist film with exposing light through a mask. Then, the resist film having been subjected to the pattern exposure is developed, thereby forming a resist pattern.