Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeong-Hun Park0
Date of Patent
November 9, 2010
Patent Application Number
11476639
Date Filed
June 29, 2006
Patent Primary Examiner
Patent abstract
A post-exposure baking apparatus comprising a supporting member, a heating member, and a cooling member is disclosed. A wafer is disposed on the supporting member and a photoresist layer is formed on the wafer. The heating member comprises electrical heating wires and is adapted to apply heat to the wafer to chemically amplify an acid generated in the photoresist layer through an exposure process using deep ultraviolet light. The cooling member is adapted to cool an outer edge of the wafer to suppress the amplification of the acid at the outer edge of the wafer.
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