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US Patent 10029405 Printing a chemical mechanical polishing pad

Patent 10029405 was granted and assigned to Applied Materials on July, 2018 by the United States Patent and Trademark Office.

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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 12011801 Printing a chemical mechanical polishing pad
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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Patent abstract

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

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Patent Inventor Names
Barry Lee Chin0
Rajeev Bajaj0
Terrance Y. Lee0
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US Patent 11685014 Formulations for advanced polishing pads
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US Patent 11679531 Chemical mechanical polishing pad and preparation thereof
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US Patent 11673225 Printing a chemical mechanical polishing pad
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US Patent 11524384 Abrasive delivery polishing pads and manufacturing methods thereof
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Patent Citations Received
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US Patent 11471999 Integrated abrasive polishing pads and manufacturing methods
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