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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

Patent 12023853 was granted and assigned to Applied Materials on July, 2024 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
Applied Materials
Applied Materials
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Current Assignee
Applied Materials
Applied Materials
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
120238530
Patent Inventor Names
Rajeev Bajaj0
Kasiraman Krishnan0
Mahendra C. Orilall0
Gregory E. Menk0
Nag B. Patibandla0
Fred C. Redeker0
Jason G. Fung0
Daniel Redfield0
...
Date of Patent
July 2, 2024
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Patent Application Number
167000620
Date Filed
December 2, 2019
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Patent Citations
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US Patent 6860793 Window portion with an adjusted rate of wear
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US Patent 6860802 Polishing pads for chemical mechanical planarization
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US Patent 6866807 High-precision modeling filament
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US Patent 6869350 Polishing pads and methods relating thereto
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US Patent 6875096 Chemical mechanical polishing pad having holes and or grooves
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US Patent 6875097 Fixed abrasive CMP pad with built-in additives
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US Patent 6896593 Microporous polishing pads
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US Patent 6896765 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber
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...
Patent Primary Examiner
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Joel D Crandall
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CPC Code
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B24D 11/001
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B24D 3/28
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B24D 3/30
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B24D 3/32
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B24B 37/24
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B24D 18/009
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B24B 37/22
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B29C 64/112
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Patent abstract

A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

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