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US Patent 7840305 Abrasive articles, CMP monitoring system and method

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Date Filed
June 28, 2006
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Date of Patent
November 23, 2010
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Patent Application Number
11427154
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Patent Citations Received
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
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US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ
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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 12017322 Chemical mechanical polishing method
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US Patent 11685014 Formulations for advanced polishing pads
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•••
Patent Inventor Names
Brian D. Goers
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Gary M. Palmgren
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Vincent J. Laraia
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Andrew H. Behr
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Daniel B. Pendergrass, Jr.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
7840305
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Patent Primary Examiner
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Sean P Shechtman
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