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US Patent 6998166 Polishing pad with oriented pore structure

Patent 6998166 was granted and assigned to Cabot Microelectronics (company) on February, 2006 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Cabot Microelectronics (company)
Cabot Microelectronics (company)
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Date Filed
June 17, 2003
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Date of Patent
February 14, 2006
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Patent Application Number
10463730
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Patent Citations Received
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ
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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes
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Patent Inventor Names
Abaneshwar Prasad
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
6998166
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Patent Primary Examiner
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Harold Pyon
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