US Patent 6998166 Polishing pad with oriented pore structure
Patent 6998166 was granted and assigned to Cabot Microelectronics (company) on February, 2006 by the United States Patent and Trademark Office.
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Article (+414 characters)
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Patent abstract
The invention provides a polishing pad for chemical-mechanical polishing comprising a body, a polishing surface, and a plurality of elongated pores, wherein about 10% or more of the elongated pores have an aspect ratio of about 3:1 or greater and are substantially oriented in a direction that is coplanar with the polishing surface. The invention further provides a method of polishing a substrate.
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Patent Inventor Names
Abaneshwar Prasad0
Date of Patent
February 14, 2006
0Patent Application Number
104637300
Date Filed
June 17, 2003
0Patent Primary Examiner
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US Patent 6998166 Polishing pad with oriented pore structure
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