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US Patent 11251068 Substrate processing apparatus and substrate processing method

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Patent abstract

A substrate processing apparatus capable of improving thin film uniformity on a substrate by controlling the position of a substrate supporting apparatus includes a plurality of reactors, wherein each of the reactors includes a substrate supporting apparatus; a ring surrounding the substrate supporting apparatus; and an alignment device for moving the substrate supporting apparatus, wherein the ring is installed such that one surface of the ring comes in contact with the substrate supporting apparatus as the substrate supporting apparatus moves and the ring is movable by a pushing force of the substrate supporting apparatus.

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Patent Inventor Names
ChangMin Lee0
DaeYoun Kim0
JaeMin Roh0
Julll Lee0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=112510680
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
112510680
Date of Patent
February 15, 2022
0
Patent Application Number
166015930
Date Filed
October 15, 2019
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=112510680
Patent Citations
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Patent Citations Received
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Patent Primary Examiner
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Charlee J. C. Bennett
0
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