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US Patent 10622196 Plasma processing apparatus

Patent 10622196 was granted and assigned to Tokyo Electron on April, 2020 by the United States Patent and Trademark Office.

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United States Patent and Trademark Office

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Patent Number

Date of Patent

April 14, 2020

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Patent Application Number

144615370

Date Filed

August 18, 2014

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Patent Citations Received

US Patent 12065730 Coating of fluid-permeable materials

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US Patent 11001925 Substrate processing apparatus

US Patent 11004977 Method for depositing a group IV semiconductor and related semiconductor device structures

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Patent Primary Examiner

Jeffrie R. Lund

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