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US Patent 11251068 Substrate processing apparatus and substrate processing method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 15, 2019
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Date of Patent
February 15, 2022
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Patent Application Number
16601593
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Patent Citations
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US Patent 10400335 Dual-direction chemical delivery system for ALD/CVD chambers
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US Patent 10590531 Substrate processing apparatus, and method of manufacturing semiconductor device
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US Patent 10600637 Formation of SiOC thin films
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US Patent 10622196 Plasma processing apparatus
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US Patent 10648788 Substrate distance monitoring
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US Patent 10714335 Method of depositing thin film and method of manufacturing semiconductor device
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US Patent 10763139 Vacuum transfer module and substrate processing apparatus
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US Patent 10854491 Dynamic leveling process heater lift
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US Patent 11018003 Method of selective silicon germanium epitaxy at low temperatures
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US Patent 10032628 Source/drain performance through conformal solid state doping
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•••
Patent Citations Received
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US Patent 11447866 High temperature chemical vapor deposition lid
Patent Inventor Names
Julll Lee
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JaeMin Roh
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ChangMin Lee
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DaeYoun Kim
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11251068
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Patent Primary Examiner
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Charlee J. C. Bennett
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