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US Patent 9505952 Polishing composition containing ceria abrasive

Patent 9505952 was granted and assigned to Cabot Microelectronics (company) on November, 2016 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Cabot Microelectronics (company)
Cabot Microelectronics (company)
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Date Filed
March 5, 2015
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Date of Patent
November 29, 2016
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Patent Applicant
Cabot Microelectronics (company)
Cabot Microelectronics (company)
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Patent Application Number
14639564
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Patent Citations Received
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11685014 Formulations for advanced polishing pads
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US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ
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US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
Patent Inventor Names
Brian Reiss
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Alexander Hains
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Dana Sauter Van Ness
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Renhe Jia
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Steven Kraft
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Viet Lam
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9505952
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Patent Primary Examiner
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Jiong-Ping Lu
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