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US Patent 7264641 Polishing pad comprising biodegradable polymer

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Patent Citations Received

US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables

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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods

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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential

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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes

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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ

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US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process

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Patent Inventor Names

Abaneshwar Prasad0

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Patent Citations Received

US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process

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Patent abstract

The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydroxybutyric acid, hydroxyvaleric acid, caprolactone, p-dioxanone, trimethylene carbonate, butylene succinate, butylene adipate, monosaccharides, dicarboxylic acid anhydrides, enantiomers thereof, and combinations thereof. The invention is further directed to methods of its use.

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Patent Citations Received

US Patent 11685014 Formulations for advanced polishing pads

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=072646410

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US Patent 07264641 Polishing pad comprising biodegradable polymer US Patent 7264641 Polishing pad comprising biodegradable polymer

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Patent Number

072646410

Patent Number

72646410

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Is a

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

072646410

Date of Patent

September 4, 2007

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Patent Application Number

107055330

Date Filed

November 10, 2003

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=072646410

Patent Primary Examiner

Michael Marcheschi

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Website URL

https://pdfpiw.uspto.gov/.piw?Docid=07264641

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US Patent 07264641 Polishing pad comprising biodegradable polymer

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Is a

Patent jurisdiction

United States Patent and Trademark Office

Patent number

07264641

Date of patent

September 4, 2007

Patent application number

10705533

Date Filed

November 10, 2003

Patent primary examiner

Michael Marcheschi

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