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US Patent 6860793 Window portion with an adjusted rate of wear

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Contents

Is a
Patent
Patent
0

Patent attributes

Patent Applicant
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
68607930
Patent Inventor Names
Naoto Kubo0
William D. Budinger0
Date of Patent
March 1, 2005
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Patent Application Number
098053280
Date Filed
March 13, 2001
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Patent Citations Received
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11958162 CMP pad construction with composite material properties using additive manufacturing processes
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11878389 Structures formed using an additive manufacturing process for regenerating surface texture in situ
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Patent Primary Examiner
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Lee D. Wilson
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Patent abstract

A polishing pad includes a polishing layer, and the transparent window portion of the polishing layer having dispersed particles to increase the rate at which the window portion wears away during a polishing operation, and to avoid forming a lump in the polishing layer.

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