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US Patent D1040304 Deposition ring for physical vapor deposition chamber

Patent D1040304 was granted and assigned to Applied Materials on August, 2024 by the United States Patent and Trademark Office.

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Edits on 29 Aug, 2024
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created this topic on 29 Aug, 2024
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Infobox (+58 properties)
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 US Patent D1040304 Deposition ring for physical vapor deposition chamber

Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
D10403040
Patent Inventor Names
Cheng-Hsiung Tsai0
David Gunther0
Kirankumar Neelasandra Savandaiah0
Date of Patent
August 27, 2024
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Patent Application Number
297967390
Date Filed
June 25, 2021
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Patent Citations
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US Patent D933725 Deposition ring for a substrate processing chamber
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US Patent D933726 Deposition ring for a semiconductor processing chamber
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US Patent 7282123 Composite sputter target and phosphor deposition method
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US Patent D557226 Electrode cover for a plasma processing apparatus
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US Patent D937329 Sputter target for a physical vapor deposition chamber
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US Patent 7520969 Notched deposition ring
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US Patent 8221602 Non-contact process kit
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US Patent D665491 Deposition chamber cover ring
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US Patent 8596870 Bearing device
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US Patent D699200 Electrode member for a plasma processing apparatus
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US Patent D703160 Grounded electrode for a plasma processing apparatus
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US Patent D709536 Focusing ring
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US Patent 8911601 Deposition ring and electrostatic chuck for physical vapor deposition chamber
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US Patent D766849 Substrate retaining ring
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US Patent 9472443 Selectively groundable cover ring for substrate process chambers
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US Patent D770992 Electrode cover for a plasma processing apparatus
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US Patent 9534286 PVD target for self-centering process shield
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US Patent 9689070 Deposition ring and electrostatic chuck for physical vapor deposition chamber
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US Patent D940670 Retainer ring for chemical mechanical polishing device
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US Patent D793976 Substrate retaining ring
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US Patent D797691 Composite edge ring
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US Patent D799437 Substrate retaining ring
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US Patent D810705 Self-centering wafer carrier for chemical vapor deposition
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US Patent 9909206 Process kit having tall deposition ring and deposition ring clamp
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US Patent 9960021 Physical vapor deposition (PVD) target having low friction pads
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US Patent 10103012 One-piece process kit shield for reducing the impact of an electric field near the substrate
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US Patent D876504 Exhaust flow control ring for semiconductor deposition apparatus
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US Patent D888903 Deposition ring for physical vapor deposition chamber
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US Patent D891382 Process shield for a substrate processing chamber
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US Patent 11390945 Temperature control assembly for substrate processing apparatus and method of using same
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US Patent 11396082 Substrate holding device and substrate processing apparatus including the same
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US Patent D992615 Focus ring
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Patent Primary Examiner
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Calvin E Vansant
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CPC Code
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H01J 37/3414
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H01J 37/3423
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F16J 7/00
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H01L 21/02631
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H01L 21/0226
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H01L 21/02263
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H01L 21/02271
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H01L 21/02269
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H01L 21/02266
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E04D 13/14
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C23C 14/35
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C23C 14/3407
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H01L 2221/68363
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H01L 21/67742
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