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US Patent D1040304 Deposition ring for physical vapor deposition chamber

Patent D1040304 was granted and assigned to Applied Materials on August, 2024 by the United States Patent and Trademark Office.

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Patent attributes

Patent Applicant

Applied Materials

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Current Assignee

Applied Materials

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Kirankumar Neelasandra Savandaiah0

David Gunther0

Cheng-Hsiung Tsai0

Date of Patent

August 27, 2024

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Patent Application Number

297967390

Date Filed

June 25, 2021

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Patent Citations

US Patent 8596870 Bearing device

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US Patent D699200 Electrode member for a plasma processing apparatus

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US Patent D703160 Grounded electrode for a plasma processing apparatus

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US Patent 7282123 Composite sputter target and phosphor deposition method

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US Patent D557226 Electrode cover for a plasma processing apparatus

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US Patent 7520969 Notched deposition ring

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US Patent 8221602 Non-contact process kit

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US Patent D665491 Deposition chamber cover ring

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Patent Primary Examiner

Calvin E Vansant

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CPC Code

0

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