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US Patent D557226 Electrode cover for a plasma processing apparatus

Patent D557226 was granted and assigned to Hitachi on December, 2007 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D5572260

Patent Inventor Names

Takeo Uchino0

Tsunehiko Tsubone0

Akitaka Makino0

Hiroyuki Shichida0

Masakazu Isozaki0

Date of Patent

December 11, 2007

Patent Application Number

292369810

Date Filed

August 25, 2005

Patent Citations Received

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US Patent D1049067 Ring for an anti-rotation process kit for a substrate processing chamber

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US Patent D1007449 Target profile for a physical vapor deposition chamber target

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US Patent 11996315 Thin substrate handling via edge clamping

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US Patent D1040304 Deposition ring for physical vapor deposition chamber

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