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US Patent 10923321 Apparatus and method of generating a pulsed waveform

Patent 10923321 was granted and assigned to Applied Materials on February, 2021 by the United States Patent and Trademark Office.

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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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Patent abstract

Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11685014 Formulations for advanced polishing pads
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1092332100
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