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US Patent 10811256 Method for etching a carbon-containing feature

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Infobox
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1081125600
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
108112560
Date of Patent
October 20, 2020
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Patent Application Number
161617440
Date Filed
October 16, 2018
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=108112560
Patent Citations
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US Patent 10018920 Lithography patterning with a gas phase resist
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US Patent 10023960 Process gas management for an inductively-coupled plasma deposition reactor
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US Patent 10047435 Dual selective deposition
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US Patent 10053774 Reactor system for sublimation of pre-clean byproducts and method thereof
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US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition
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US Patent 10276355 Multi-zone reactor, system including the reactor, and method of using the same
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US Patent 10340125 Pulsed remote plasma method and system
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US Patent 10340135 Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
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US Patent 10343920 Aligned carbon nanotubes
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US Patent 10347547 Suppressing interfacial reactions by varying the wafer temperature throughout deposition
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US Patent 10361201 Semiconductor structure and device formed using selective epitaxial process
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US Patent 10388513 Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
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US Patent 10395917 Si precursors for deposition of SiN at low temperatures
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US Patent 10395919 Method and apparatus for filling a gap
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US Patent 10428419 Combination CVD/ALD method, source and pulse profile modification
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US Patent 10435790 Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
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US Patent 10468244 Precursors and flowable CVD methods for making low-K films to fill surface features
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US Patent 10483154 Front-end-of-line device structure and method of forming such a front-end-of-line device structure
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Patent Primary Examiner
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Lan Vinh
0
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