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US Patent 10622196 Plasma processing apparatus

Patent 10622196 was granted and assigned to Tokyo Electron on April, 2020 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12065730 Coating of fluid-permeable materials
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=106221960
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Patent Citations Received
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US Patent D947913 Susceptor shaft
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Infobox
Patent Citations Received
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US Patent 11274369 Thin film deposition method
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Infobox
Is a
Patent
Patent
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Patent Applicant
Tokyo Electron
Tokyo Electron
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
106221960
Date of Patent
April 14, 2020
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Patent Application Number
144615370
Date Filed
August 18, 2014
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=106221960
Patent Citations Received
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US Patent 11242598 Structures including metal carbide material, devices including the structures, and methods of forming same
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US Patent 11244825 Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
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US Patent 11001925 Substrate processing apparatus
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US Patent 11004977 Method for depositing a group IV semiconductor and related semiconductor device structures
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US Patent 11015245 Gas-phase reactor and system having exhaust plenum and components thereof
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US Patent 11018002 Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
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US Patent 11022879 Method of forming an enhanced unexposed photoresist layer
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US Patent 11031242 Methods for depositing a boron doped silicon germanium film
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US Patent D922229 Device for controlling a temperature of a gas supply unit
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US Patent 11049751 Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
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US Patent 11053591 Multi-port gas injection system and reactor system including same
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US Patent 11056344 Layer forming method
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US Patent 11251035 Method of forming a structure on a substrate
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US Patent 11251040 Cyclical deposition method including treatment step and apparatus for same
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US Patent 11251068 Substrate processing apparatus and substrate processing method
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US Patent D944946 Shower plate
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US Patent 11270899 Wafer handling chamber with moisture reduction
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US Patent 11274369 Thin film deposition method
0
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US Patent 11282698 Method of forming topology-controlled amorphous carbon polymer film
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US Patent 11286558 Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
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US Patent 11286562 Gas-phase chemical reactor and method of using same
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US Patent 11289326 Method for reforming amorphous carbon polymer film
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US Patent D947913 Susceptor shaft
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US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
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US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
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Patent Primary Examiner
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Jeffrie R. Lund
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Infobox
Patent Citations Received
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US Patent 11056344 Layer forming method
0
Edits on 31 Mar, 2023
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