Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chiyu Zhu0
Kiran Shrestha0
Qi Xie0
Date of Patent
July 6, 2021
0Patent Application Number
156912410
Date Filed
August 30, 2017
0Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
There is provided a method of forming a layer, comprising depositing a seed layer on the substrate and depositing a bulk layer on the seed layer. Depositing the seed layer comprises supplying a first precursor comprising metal and halogen atoms to the substrate; and supplying a first reactant to the substrate. Depositing the bulk layer comprises supplying a second precursor comprising metal and halogen atoms to the seed layer and supplying a second reactant to the seed layer.
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