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US Patent 10322384 Counter flow mixer for process chamber
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Is a
Patent
Date Filed
March 10, 2016
Date of Patent
June 18, 2019
Patent Application Number
15067028
Patent Citations
US Patent 10032792 Semiconductor device and manufacturing method thereof
US Patent 10043661 Method for protecting layer by forming hydrocarbon-based extremely thin film
US Patent 10083836 Formation of boron-doped titanium metal films with high work function
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US Patent 10087522 Deposition of metal borides
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US Patent 10090316 3D stacked multilayer semiconductor memory using doped select transistor channel
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US Patent 10087525 Variable gap hard stop design
0
US Patent 10103040 Apparatus and method for manufacturing a semiconductor device
US Patent 10032628 Source/drain performance through conformal solid state doping
US Patent 10023960 Process gas management for an inductively-coupled plasma deposition reactor
0
Patent Citations Received
US Patent 10950432 Method of depositing thin film and method of manufacturing semiconductor device
US Patent 11286558 Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
0
US Patent 11289326 Method for reforming amorphous carbon polymer film
US Patent D947913 Susceptor shaft
0
US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
0
US Patent 11230766 Substrate processing apparatus and method
US Patent 11232963 Substrate processing apparatus and method
US Patent 11233133 NbMC layers
0
US Patent 10559458 Method of forming oxynitride film
•••
Patent Inventor Names
John F. Stumpf
0
Chris Wuester
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10322384
Patent Primary Examiner
Rudy Zervigon
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