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US Patent 9895715 Selective deposition of metals, metal oxides, and dielectrics

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Patent Citations Received
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US Patent 11967525 Selective tungsten deposition at low temperatures
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Patent abstract

Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

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Patent Citations Received
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US Patent 11830732 Selective passivation and selective deposition
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Patent Citations Received
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US Patent 11804373 Selective layer formation using deposition and removing
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Patent Inventor Names
Antti Niskanen0
Eva Tois0
Hannu Huotari0
Ivo Raaijmakers0
Marko Tuominen0
Raija H. Matero0
Suvi P. Haukka0
Viljami J. Pore0
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US Patent 09895715 Selective deposition of metals, metal oxides, and dielectrics US Patent 9895715 Selective deposition of metals, metal oxides, and dielectrics

Infobox
Patent Number
098957150
Patent Number
98957150
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
098957150
Date of Patent
February 20, 2018
0
Patent Application Number
146127840
Date Filed
February 3, 2015
0
Patent Primary Examiner
‌
Bret P Chen
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 US Patent 09895715 Selective deposition of metals, metal oxides, and dielectrics

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
09895715
Date of patent
February 20, 2018
Patent application number
14612784
Date Filed
February 3, 2015
Patent primary examiner
‌
Bret P Chen

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