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US Patent 9895715 Selective deposition of metals, metal oxides, and dielectrics

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Is a
Patent
Patent
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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
98957150
Patent Inventor Names
Hannu Huotari0
Antti Niskanen0
Eva Tois0
Ivo Raaijmakers0
Marko Tuominen0
Raija H. Matero0
Suvi P. Haukka0
Viljami J. Pore0
Date of Patent
February 20, 2018
0
Patent Application Number
146127840
Date Filed
February 3, 2015
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Patent Citations Received
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US Patent 11776807 Plasma enhanced deposition processes for controlled formation of oxygen containing thin films
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US Patent 11804373 Selective layer formation using deposition and removing
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US Patent 11967525 Selective tungsten deposition at low temperatures
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US Patent 11830732 Selective passivation and selective deposition
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Patent Primary Examiner
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Bret P Chen
0
Patent abstract

Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

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