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US Patent 9895715 Selective deposition of metals, metal oxides, and dielectrics

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Date Filed
February 3, 2015
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Date of Patent
February 20, 2018
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Patent Application Number
14612784
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Patent Citations Received
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US Patent 11776807 Plasma enhanced deposition processes for controlled formation of oxygen containing thin films
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US Patent 11804373 Selective layer formation using deposition and removing
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US Patent 11967525 Selective tungsten deposition at low temperatures
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US Patent 11830732 Selective passivation and selective deposition
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Patent Inventor Names
Hannu Huotari
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Antti Niskanen
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Eva Tois
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Ivo Raaijmakers
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Marko Tuominen
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Raija H. Matero
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Suvi P. Haukka
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Viljami J. Pore
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9895715
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Patent Primary Examiner
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Bret P Chen
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