Log in
Enquire now
‌

US Patent 9881820 Front opening ring pod

Patent 9881820 was granted and assigned to Lam Research on January, 2018 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Lam Research
Lam Research
Date Filed
April 25, 2016
Date of Patent
January 30, 2018
Patent Applicant
Lam Research
Lam Research
Patent Application Number
15138097
Patent Citations Received
‌
US Patent 12125673 Pulsed voltage source for plasma processing applications
0
‌
US Patent 12094752 Wafer edge ring lifting solution
0
‌
US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
‌
US Patent 12111341 In-situ electric field detection method and apparatus
0
‌
US Patent 11745302 Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
‌
US Patent 11764089 Semiconductor wafer storage device
‌
US Patent 11772229 Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
‌
US Patent 11842917 Process kit ring adaptor
0
‌
US Patent 11887879 In-situ apparatus for semiconductor process module
0
‌
US Patent 11908661 Apparatus and methods for manipulating power at an edge ring in plasma process device
0
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9881820
Patent Primary Examiner
‌
Bryon Gehman

Find more entities like US Patent 9881820 Front opening ring pod

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo
By using this site, you agree to our Terms of Service.