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US Patent 11894423 Contact resistance reduction in nanosheet device structure
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Patent
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Date Filed
February 22, 2022
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Date of Patent
February 6, 2024
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Patent Application Number
17677007
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Patent Citations
US Patent 9461149 Nanowire structure with selected stack removed for reduced gate resistance and method of fabricating same
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US Patent 9716143 Silicide regions in vertical gate all around (VGAA) devices and methods of forming same
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US Patent 9837414 Stacked complementary FETs featuring vertically stacked horizontal nanowires
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US Patent 9847390 Self-aligned wrap-around contacts for nanosheet devices
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US Patent 9881926 Static random access memory (SRAM) density scaling by using middle of line (MOL) flow
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US Patent 9947804 Methods of forming nanosheet transistor with dielectric isolation of source-drain regions and related structure
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US Patent 10032867 Forming bottom isolation layer for nanosheet technology
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US Patent 10236217 Stacked field-effect transistors (FETs) with shared and non-shared gates
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US Patent 10263100 Buffer regions for blocking unwanted diffusion in nanosheet transistors
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US Patent 10361131 Stacked field-effect transistors (FETs) with shared and non-shared gates
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•••
Patent Inventor Names
Lan Yu
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Dechao Guo
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Heng Wu
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Reinaldo Vega
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Adra Carr
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Ruqiang Bao
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Junli Wang
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11894423
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Patent Primary Examiner
Latanya N Crawford Eason
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CPC Code
H01L 29/6656
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H01L 21/823418
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H01L 29/0653
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H01L 29/0673
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H01L 21/02532
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H01L 21/02603
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H01L 29/165
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H01L 29/7851
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H01L 29/66553
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H01L 21/823468
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•••
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