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US Patent 11894423 Contact resistance reduction in nanosheet device structure

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
1
Date Filed
February 22, 2022
1
Date of Patent
February 6, 2024
1
Patent Application Number
17677007
1
Patent Citations
‌
US Patent 9461149 Nanowire structure with selected stack removed for reduced gate resistance and method of fabricating same
1
‌
US Patent 9716143 Silicide regions in vertical gate all around (VGAA) devices and methods of forming same
1
‌
US Patent 9837414 Stacked complementary FETs featuring vertically stacked horizontal nanowires
1
‌
US Patent 9847390 Self-aligned wrap-around contacts for nanosheet devices
1
‌
US Patent 9881926 Static random access memory (SRAM) density scaling by using middle of line (MOL) flow
1
‌
US Patent 9947804 Methods of forming nanosheet transistor with dielectric isolation of source-drain regions and related structure
1
‌
US Patent 10032867 Forming bottom isolation layer for nanosheet technology
1
‌
US Patent 10236217 Stacked field-effect transistors (FETs) with shared and non-shared gates
1
‌
US Patent 10263100 Buffer regions for blocking unwanted diffusion in nanosheet transistors
1
‌
US Patent 10361131 Stacked field-effect transistors (FETs) with shared and non-shared gates
1
•••
Patent Inventor Names
Lan Yu
1
Dechao Guo
1
Heng Wu
1
Reinaldo Vega
1
Adra Carr
1
Ruqiang Bao
1
Junli Wang
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
11894423
1
Patent Primary Examiner
‌
Latanya N Crawford Eason
1
CPC Code
‌
H01L 29/6656
1
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H01L 21/823418
1
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H01L 29/0653
1
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H01L 29/0673
1
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H01L 21/02532
1
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H01L 21/02603
1
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H01L 29/165
1
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H01L 29/7851
1
‌
H01L 29/66553
1
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H01L 21/823468
1
•••

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