Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 15, 2022
Patent Application Number
17113383
Date Filed
December 7, 2020
Patent Citations
...
Patent Citations Received
Patent Primary Examiner
Methods and systems for selectively depositing dielectric films on a first surface of a substrate relative to a passivation layer previously deposited on a second surface are provided. The methods can include at least one cyclical deposition process used to deposit material on the first surface while the passivation layer is removed, thereby preventing deposition over the passivation layer.
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