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US Patent 10204782 Combined anneal and selective deposition process

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10204782
Date of Patent
February 12, 2019
Patent Application Number
15132091
Date Filed
April 18, 2016
Patent Citations Received
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US Patent 12092953 Patterning of nanostructures using imprint lithography
0
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US Patent 11501966 Selective layer formation using deposition and removing
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US Patent 11830732 Selective passivation and selective deposition
0
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US Patent 11446699 Vapor phase deposition of organic films
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US Patent 11501965 Plasma enhanced deposition processes for controlled formation of metal oxide thin films
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US Patent 10453701 Deposition of organic films
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US Patent 11525184 Dual selective deposition
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US Patent 10551741 Method of forming a directed self-assembled layer on a substrate
...
Patent Primary Examiner
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Caridad Everhart
Patent abstract

A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.

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