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US Patent 10367080 Method of forming a germanium oxynitride film

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Patent abstract

A method for forming layers suitable for a V-NAND stack is disclosed. Specifically, the method may include multiple cycles for forming an oxide and a nitride in order to form an oxynitride layer.

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Patent Inventor Names
Fu Tang0
Jan Willem Maes0
Michael Eugene Givens0
Qi Xie0
Xiaoqiang Jiang0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=103670800
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Patent Citations Received
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US Patent D947913 Susceptor shaft
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Patent Citations Received
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US Patent 10851456 Deposition of metal borides
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Patent Citations Received
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US Patent 11274369 Thin film deposition method
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US Patent 11018047 Hybrid lift pin
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