Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jack Jau0
Xuedong Liu0
Zhongwei Chen0
Shuai Li0
Weiming Ren0
Date of Patent
March 19, 2019
0Patent Application Number
150783690
Date Filed
March 23, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
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