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US Patent 10190213 Deposition of metal borides

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

April 21, 2016

Date of Patent

January 29, 2019

Patent Application Number

15135333

Patent Citations Received

US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures

US Patent 11289326 Method for reforming amorphous carbon polymer film

US Patent D947913 Susceptor shaft

US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures

US Patent 11230766 Substrate processing apparatus and method

US Patent 11232963 Substrate processing apparatus and method

US Patent 11233133 NbMC layers

US Patent 10559458 Method of forming oxynitride film

US Patent 10561975 Variable conductance gas distribution apparatus and method

US Patent D876504 Exhaust flow control ring for semiconductor deposition apparatus

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

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