US Patent 10163606 Plasma reactor with highly symmetrical four-fold gas injection
Patent 10163606 was granted and assigned to Applied Materials on December, 2018 by the United States Patent and Trademark Office.
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Patent abstract
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
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Patent Number
101636060
Date of Patent
December 25, 2018
0Patent Application Number
147622240
Date Filed
February 3, 2014
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Patent Number
101636060
Date of Patent
December 25, 2018
0Patent Application Number
147622240
Date Filed
February 3, 2014
0Patent Citations Received
Patent Primary Examiner
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US Patent 10163606 Plasma reactor with highly symmetrical four-fold gas injection
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
10163606
Date of patent
December 25, 2018
Patent application number
14762224
Date Filed
February 3, 2014
Patent primary examiner
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